Burble manner of nitriding titanium burble liquid, and nitriding titanium coat

摘要

P To provide a titanium nitride peeling liquid for peeling a titanium nitride film where, even in a semiconductor multilayer stacked body particularly comprising tungsten or a tungsten alloy and a titanium nitride film can be peeled without eroding this layer. PSOLUTION: The titanium nitride peeling liquid comprises hydrofluoric acid, hydrogen peroxide and water and further comprises inorganic acid other than hydrofluoric acid. Since the titanium nitride peeling liquid comprises inorganic acid other than the hydrofluoric acid, even in the case the semiconductor multilayer stacked body comprises the tungsten or the tungsten alloy, the titanium nitride peeling liquid does not erode such a layer and a titanium nitride film can be peeled. PCOPYRIGHT: (C)2009 and JPO& INPIT