Substrate cleaning apparatus and a substrate cleaning method and a substrate cleaning program computer-readable recording medium recording the

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning device, a substrate cleaning method, and a substrate cleaning program, which enable good cleaning of a substrate without damaging the surface of the substrate.;SOLUTION: A substrate cleaning device includes: liquid layer retention means (25) having a nozzle (40) for forming a liquid layer (52) of a cleaning solution; substrate heating means (24) for heating a surface of a substrate (2) to or above the boiling point of the cleaning solution; and an elevation mechanism (41a) for bringing the nozzle (40) close to the substrate (2), in which the elevation mechanism (41a) is controlled so that the liquid layer (52) formed on the nozzle (40) is heated with a surface heat of the substrate (2) heated by the substrate heating means (24) to form a vapor layer (60) between the liquid layer (52) and the surface of the substrate (2) and thereby cleaning the surface thereof.;COPYRIGHT: (C)2013,JPO&INPIT