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OPTIMIZED ANTI-REFLECTION COATING LAYER FOR CRYSTALLINE SILICON SOLAR CELLS

机译:晶体硅太阳能电池的优化抗反射涂层

摘要

Embodiments of the invention include a solar cell and methods of forming a solar cell. Specifically, the methods may be used to form a passivation/anti-reflection layer having desired functional and optical properties on a solar cell substrate. In one embodiment, a method of forming an anti-reflection layer on a solar cell substrate, the method includes flowing a first processing gas mixture into a processing chamber, wherein the first processing gas mixture includes at least a silicon containing gas and a nitrogen containing gas, wherein a ratio by flow volume of the silicon containing gas to the nitrogen containing gas supplied to the first processing gas mixture is controlled at between about 2:1 to about 1:5, applying a source RF power to the processing chamber in the presence of the first processing gas mixture, controlling the process pressure under 100 mTorr, and forming a silicon nitride containing layer on the substrate.
机译:本发明的实施例包括太阳能电池和形成太阳能电池的方法。具体地,该方法可以用于在太阳能电池基板上形成具有期望的功能和光学特性的钝化/抗反射层。在一个实施例中,一种在太阳能电池基板上形成抗反射层的方法,该方法包括使第一处理气体混合物流入处理室,其中第一处理气体混合物至少包括含硅气体和含氮气体。气体,其中将供应给第一处理气体混合物的含硅气体与含氮气体的流量比控制在大约2:1至大约1:5之间,向源极中的处理室施加源RF功率。存在第一处理气体混合物,将处理压力控制在100 mTorr以下,并在基板上形成含氮化硅的层。

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