Al 2 O 3 /TiO 2 double layer anti-reflection coating film for crystalline silicon solar cells formed by spray pyrolysis

摘要

Abstract An Al 2 O 3 /TiO 2 double layer anti-reflection coating (ARC) film formed by spray pyrolysis was introduced for monocrystalline silicon solar cells as the nonvacuum processing method. The thickness of the Al 2 O 3 layer and TiO 2 compact layer was controlled by the volume of deposited precursor solution and confirmed by ellipsometry and scanning electron microscopy. The average photovoltaic properties of photocurrent density ( J sc ), open-circuit photovoltage ( V oc ), fill factor ( FF ), and photo energy conversion efficiency ( ???· ) were 37.0 mA/cm 2 , 590 mV, 0.712, and 15.5%, respectively. A significant improvement on J sc and ???· could be confirmed owing to the Al 2 O 3 /TiO 2 ARC. The results of Fourier transform infrared (FTIR) spectroscopy and optical simulation with modeling for the reflectance properties confirmed that C-H-based organics remained after the deposition of thin films.