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Method of Manufacturing a Semiconductor Device Using an Impurity Source Containing a Metallic Recombination Element and Semiconductor Device

机译:使用包含金属复合元素的杂质源制造半导体器件的方法和半导体器件

摘要

Source zones of a first conductivity type and body zones of a second conductivity type are formed in a semiconductor die. The source zones directly adjoin a first surface of the semiconductor die. A dielectric layer adjoins the first surface. Polysilicon plugs extend through the dielectric layer and are electrically connected to the source and the body zones. An impurity source containing at least one metallic recombination element is provided in contact with deposited polycrystalline silicon material forming the polysilicon plugs and distant to the semiconductor die. Atoms of the metallic recombination element, for example platinum atoms, may be diffused out from the impurity source into the semiconductor die to reliably reduce the reverse recovery charge.
机译:在半导体管芯中形成第一导电类型的源极区和第二导电类型的体区。源极区直接邻接半导体管芯的第一表面。介电层邻接第一表面。多晶硅塞延伸穿过介电层并电连接到源极和主体区。提供包含至少一种金属复合元素的杂质源,该杂质源与沉积的形成多晶硅塞的多晶硅材料接触并且远离半导体管芯。金属重组元素的原子,例如铂原子,可以从杂质源扩散到半导体管芯中,以可靠地减少反向恢复电荷。

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