首页> 外国专利> Method for quantitatively evaluating concentration of atomic vacancies existing in silicon wafer, method for manufacturing silicon wafer, and silicon wafer manufactured by the method for manufacturing silicon wafer

Method for quantitatively evaluating concentration of atomic vacancies existing in silicon wafer, method for manufacturing silicon wafer, and silicon wafer manufactured by the method for manufacturing silicon wafer

机译:定量评估硅晶片中存在的原子空位浓度的方法,硅晶片的制造方法以及通过该硅晶片的制造方法制造的硅晶片

摘要

A quantitative evaluation method, a method for manufacturing a silicon wafer, and a silicon wafer manufactured by the method, enabling more efficient evaluation of the concentration of atomic vacancies existing in a silicon wafer. The quantitative evaluation method includes steps of: oscillating, in a state in which an external magnetic field is applied to a silicon wafer (26) while keeping the silicon wafer (26) at a constant temperature, an ultrasonic wave pulse and receiving a measurement wave pulse obtained after the ultrasonic wave pulse is propagated through the silicon wafer (26) for detecting a phase difference between the ultrasonic wave pulse and the measurement wave pulse; and calculating an elastic constant from the phase difference. The external magnetic field is changed to calculate the elastic constant corresponding to a change in the external magnetic field for evaluating a concentration of atomic vacancies in the silicon wafer (26).
机译:定量评估方法,用于制造硅晶片的方法以及通过该方法制造的硅晶片,使得能够更有效地评估硅晶片中存在的原子空位的浓度。定量评价方法包括以下步骤:在保持硅晶片( 26 )的同时,在对硅晶片( 26 )施加外部磁场的状态下振荡。在恒定温度下,超声波脉冲和接收在超声波脉冲传播通过硅晶片( 26 )之后获得的测量波脉冲,用于检测超声波脉冲和测量信号之间的相位差波动脉冲根据该相位差算出弹性常数。改变外部磁场以计算对应于外部磁场变化的弹性常数,以评估硅晶片( 26 )中原子空位的浓度。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号