首页> 外国专利> Ohmic electrode for SiC semiconductor, method of manufacturing ohmic electrode for SiC semiconductor, semiconductor device, and method of manufacturing semiconductor device

Ohmic electrode for SiC semiconductor, method of manufacturing ohmic electrode for SiC semiconductor, semiconductor device, and method of manufacturing semiconductor device

机译:SiC半导体用欧姆电极,SiC半导体用欧姆电极的制造方法,半导体装置及半导体装置的制造方法

摘要

An ohmic electrode for SiC semiconductor that contains Si and Ni or an ohmic electrode for SiC semiconductor that further contains Au or Pt in addition to Si and Ni is provided. In addition, a method of manufacturing the ohmic electrode for SiC semiconductor, a semiconductor device including the ohmic electrode for SiC semiconductor, and a method of manufacturing the semiconductor device are provided.
机译:提供了一种包含Si和Ni的用于SiC半导体的欧姆电极或除了Si和Ni之外还包含Au或Pt的用于SiC半导体的欧姆电极。另外,提供了一种用于SiC半导体的欧姆电极的制造方法,包括用于SiC半导体的欧姆电极的半导体器件以及该半导体器件的制造方法。

著录项

  • 公开/公告号US8623752B2

    专利类型

  • 公开/公告日2014-01-07

    原文格式PDF

  • 申请/专利权人 KAZUHIRO FUJIKAWA;HIDETO TAMASO;

    申请/专利号US20070444537

  • 发明设计人 KAZUHIRO FUJIKAWA;HIDETO TAMASO;

    申请日2007-08-13

  • 分类号H01L21/44;

  • 国家 US

  • 入库时间 2022-08-21 15:59:03

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