Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection film

摘要

Disclosed is a composition comprising a hydrolysate of an alkoxysilane compound, a hydrolysate of a siloxane compound represented by Formula (1), a surfactant, and an element having an electronegativity of 2.5 or less. In Formula (1), R^A and R^B independently represent a hydrogen atom, a phenyl group, —C_aH_2a+1, —(CH₂)_b(CF₂)_cCF₃ or —C_dH_2d−1, R^A and R^B are not both hydrogen atoms simultaneously, R^C and R^D independently represent a single bond that links a silicon atom and an oxygen atom to form a cyclic siloxane structure, or each independently represent a hydrogen atom, a phenyl group, —C_aH_2a+1, —(CH₂)_b(CF₂)_cCF₃, or —C_dH_2d−1, a represents an integer of 1 to 6, b represents an integer of 0 to 4, c represents an integer of 0 to 10, d represents an integer of 2 to 4, and n represents an integer of 3 or greater.;