首页> 外国专利> A PROCESS FOR THE PREPARATION OF BRUSH PLATED TIN SULFO SELENIDE SEMICONDUCTOR THIN FILM ELECTRODE USEFUL FOR PHOTO ELECTROCHEMICAL (PEC) CELLS

A PROCESS FOR THE PREPARATION OF BRUSH PLATED TIN SULFO SELENIDE SEMICONDUCTOR THIN FILM ELECTRODE USEFUL FOR PHOTO ELECTROCHEMICAL (PEC) CELLS

机译:制备用于光化学(PEC)电池的电刷镀锡硫磺硒化半导体薄膜电极的方法

摘要

The present invention provides a process for the preparation of tin sulfo selenide semiconductor thin film electrode useful for photoelectrochemical cells. The thin tin sulfo selenide semiconductor thin film is prepared through a simple and cost effective brush plating method on tin oxide coated glass substrates from a solution of 5.0 mM of SnCI2, 2.5mM of Na2S2O3 and 2.5 mM of SeO2. The pH and temperature was maintained at 1-1.5 and 25-30°C, respectively, throughout the experiment. XRD pattern of brush plated SnS0.5Se0.5 film prepared under optimized conditions showed polycrystalline nature with peaks corresponding to orthorhombic structure. The tin sulfo selenide thin film electrode prepared is of p type in nature and found to be chemically and photo chemically stable.
机译:本发明提供了制备用于光电化学电池的磺基硒化锡半导体薄膜电极的方法。通过简单且经济高效的刷镀方法,在氧化锡涂层的玻璃基板上,从5.0 mM的SnCl2、2.5mM的Na2S2O3和2.5mM的SeO2溶液中制备磺基硒化锡薄膜半导体薄膜。在整个实验过程中,pH和温度分别保持在1-1.5和25-30°C。在优化条件下制备的刷镀SnS0.5Se0.5薄膜的XRD图谱显示多晶性,其峰对应于正交晶结构。所制备的磺基硒化锡薄膜电极本质上是p型的,化学和光化学稳定。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号