Deposition process metal by physical deposition in vapor phase and method of generating roughnesses nanoparticles.

摘要

Deposition process metal by physical deposition in vapor phase and method of generating roughnesses nanoparticles. # Deposition process of metal nanoparticles on all types of substrates by sputtering, where because the deposition is performed at a power density between 0.2- 5 W / cm {sup, 2} at a pressure between 60 and 180 Pa, in the presence of a noble gas. Thanks the method of the invention is possible to deposit nanoparticles on any type of substrate (polymers, fibers, silicon ...), at low temperatures, particularly at room temperature, without limitation in the deposition area without restrictions on time in the which the deposit is made. After deposition, reversing the polarity can be performed nanoscale roughness on the substrate.