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CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG

机译:具有通过基质(TSV)基质塞的电容式微机械超声传感器(CMUT)

摘要

A capacitive micromachined ultrasonic transducer (CMUT) device 100 includes at least one CMUT cell 100a including a first substrate 101 of a single crystal material having a top side including a patterned dielectric layer thereon including a thick 106 and a thin 107 dielectric region, and a through- substrate via (TSV) 111 extending a full thickness of the first substrate. The TSV is formed of the single crystal material, is electrically isolated by isolation regions 131 in the single crystal material, and is positioned under a top side contact area 102a of the first substrate. A membrane layer 120b is bonded to the thick dielectric region and over the thin dielectric region to provide a movable membrane over a microelectromechanical system (MEMS) cavity 114. A metal layer 161 is over the top side substrate contact area and over the movable membrane including coupling of the top side substrate contact area to the movable membrane.
机译:电容性微机械超声换能器(CMUT)装置100包括至少一个CMUT单元100a,该单元包括单晶材料的第一基板101,该基板的顶侧包括图案化的介电层,该介电层上包括厚的106和薄的107介电区,以及贯穿衬底通孔(TSV)111延伸第一衬底的整个厚度。 TSV由单晶材料形成,通过单晶材料中的隔离区域131电隔离,并且位于第一基板的顶侧接触区域102a的下方。膜层120b结合到厚介电区并在薄介电区上,以在微机电系统(MEMS)腔114上方提供可移动膜。金属层161在顶侧基板接触区域上方和可移动膜上方,包括将顶侧基板接触区域耦合到可移动膜。

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