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CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG
CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG
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机译:具有通过基质(TSV)基质塞的电容式微机械超声传感器(CMUT)
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摘要
A capacitive micromachined ultrasonic transducer (CMUT) device 100 includes at least one CMUT cell 100a including a first substrate 101 of a single crystal material having a top side including a patterned dielectric layer thereon including a thick 106 and a thin 107 dielectric region, and a through- substrate via (TSV) 111 extending a full thickness of the first substrate. The TSV is formed of the single crystal material, is electrically isolated by isolation regions 131 in the single crystal material, and is positioned under a top side contact area 102a of the first substrate. A membrane layer 120b is bonded to the thick dielectric region and over the thin dielectric region to provide a movable membrane over a microelectromechanical system (MEMS) cavity 114. A metal layer 161 is over the top side substrate contact area and over the movable membrane including coupling of the top side substrate contact area to the movable membrane.
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