首页> 外国专利> CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG

CAPACITIVE MICROMACHINED ULTRASONIC TRANSDUCER (CMUT) WITH THROUGH-SUBSTRATE VIA (TSV) SUBSTRATE PLUG

机译:具有通过基质(TSV)基质塞的电容式微机械超声传感器(CMUT)

摘要

A Capacitive Micromachined Ultrasonic Transducer (CMUT) device includes at least one CMUT cell including a first substrate of a single crystal material having a top side including a patterned dielectric layer thereon including a thick and a thin dielectric region, and a through-substrate via (TSV) extending a full thickness of the first substrate. The TSV is formed of the single crystal material, is electrically isolated by isolation regions in the single crystal material, and is positioned under a top side contact area of the first substrate. A membrane layer is bonded to the thick dielectric region and over the thin dielectric region to provide a movable membrane over a micro-electro-mechanical system (MEMS) cavity. A metal layer is over the top side substrate contact area and over the movable membrane including coupling of the top side substrate contact area to the movable membrane.
机译:电容式微机械超声换能器(CMUT)装置,包括至少一个CMUT单元,该单元包括单晶材料的第一基板,该基板的顶侧包括图案化的介电层,该基板上包括厚的和薄的介电区,以及贯通的基板通孔( TSV)延伸第一衬底的整个厚度。 TSV由单晶材料形成,通过单晶材料中的隔离区域电隔离,并且位于第一基板的顶侧接触区域下方。膜层结合到厚介电区并在薄介电区上方,以在微机电系统(MEMS)腔体上方提供可移动膜。金属层在顶侧基板接触区域上方和可移动膜上方,包括顶侧基板接触区域与可移动膜的耦合。

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