首页> 外国专利> FULLY COMPENSATED SYNTHETIC ANTIFERROMAGNET FOR SPINTRONICS APPLICATIONS

FULLY COMPENSATED SYNTHETIC ANTIFERROMAGNET FOR SPINTRONICS APPLICATIONS

机译:面向全电子应用的全补偿合成抗铁磁网

摘要

A synthetic antiferromagnet (30) that may serve as a reference layer for a magnetic tunnel junction (MTJ) is disclosed and is a laminate with a plurality of "x+1" magnetic sub-layers (22a...22(x+1)) and "x" non-magnetic spacers (23a...23x) arranged in an alternating fashion such that there is a magnetic sub-layer at the top and bottom of the laminated stack. Each spacer has a top surface and bottom surface that interfaces with an adjoining magnetic sub-layer and thereby generates antiferromagnetic coupling between the adjoining sub¬ layers. Perpendicular magnetic anisotropy (PMA) is also induced in each magnetic sub-layer through an interface with a spacer. As a result, the dipole field exerted on a free layer is substantially reduced compared with that produced by a conventional synthetic antiferromagnetic reference layer. Magnetic sub-layers are preferably Co while Ru, Rh, or Ir may serve as non-magnetic spacers.
机译:公开了一种可以用作磁性隧道结(MTJ)参考层的合成反铁磁体(30),它是具有多个“ x + 1”磁性子层(22a ... 22(x + 1) ))和以交替方式排列的“ x”个非磁性垫片(23a ... 23x),以便在叠层的顶部和底部有一个磁性子层。每个间隔物具有与邻接的磁性子层相接的顶表面和底表面,从而在邻接的子层之间产生反铁磁耦合。还通过与间隔物的界面在每个磁性子层中引起垂直磁各向异性(PMA)。结果,与常规的合成反铁磁参考层所产生的偶极场相比,施加在自由层上的偶极场被大大减小。磁性子层优选为Co,而Ru,Rh或Ir可以用作非磁性间隔物。

著录项

  • 公开/公告号WO2014172224A1

    专利类型

  • 公开/公告日2014-10-23

    原文格式PDF

  • 申请/专利权人 HEADWAY TECHNOLOGIES INC.;

    申请/专利号WO2014US33912

  • 发明设计人 JAN GUENOLE;TONG RU-YING;

    申请日2014-04-14

  • 分类号H01L43/08;H01F10/30;H01F10/32;H01L43/12;

  • 国家 WO

  • 入库时间 2022-08-21 15:46:23

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