Apparatus (1) for substrate treatment with a highly focused light stroke, comprises a light source (4) and a holder (5) of the light source to a distance to a substrate (2), and a conveyor (7), which is provided for a continuous substrate transport. The substrate is movable relative to the light stroke in transport direction by means of the conveyor. The conveyor is supported vertically relative to a supporting surface and the holder relative to the conveyor. Apparatus (1) for substrate treatment with a highly focused light stroke, comprises a light source (4) and a holder (5) of the light source to a distance to a substrate (2), and a conveyor (7), which is provided for a continuous substrate transport. The substrate is movable relative to the light stroke in transport direction by means of the conveyor. The conveyor is supported vertically relative to a supporting surface and the holder relative to the conveyor. The highly focused light stroke is problematic by (a) at least one light source for generating light stroke on one of the outer surfaces of the substrate, (b) the distance between the light source and the substrate, and (c) critical vibrations from the supporting surface of the apparatus. A double vibration-damping bearing is provided between the supporting surface and the conveyor many times and/or between the conveyor and the holder. The bearing has a predetermined bearing vibration. An independent claim is also included for mounting the shock-sensitive apparatus.
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