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METHOD OF FABRICATING ReRAM CAPABLE OF ADJUSTING CONDUCTIVE FILAMENTS AND ReRAM FABRICATED BY SAME

机译:制造可调节导电丝的ReRAM的方法和相同制造的ReRAM

摘要

The present invention is to provide a method of fabricating a resistive random access memory (ReRAM), capable of controlling electrical characteristics by controlling the positions and the number of conductive filaments. The method includes the steps of: (a) preparing a substrate; (b) forming a lower electrode layer on the substrate; (c) forming a metallic oxide material representing resistive switching characteristics on the lower electrode layer; (d) forming a protective layer to protect the metallic oxide material and to form conductive filaments in required shape and required number on the metallic oxide material; (e) forming a protective layer having a pattern structure without a specific region of the protective layer by etching the protective layer up to the metallic oxide material through a photolithography process; (f) performing a metallic implantation process on an entire portion of the protective layer to locally form a region including a large quantity of metal in the metallic oxide material, corresponding to the patterned structure, thereby forming the conductive filaments; and (g) removing the protective layer having the patterned structure.;COPYRIGHT KIPO 2014
机译:本发明提供一种制造电阻式随机存取存储器(ReRAM)的方法,该方法能够通过控制导电丝的位置和数量来控制电特性。该方法包括以下步骤:(a)准备衬底; (b)在基板上形成下部电极层; (c)在下部电极层上形成代表电阻切换特性的金属氧化物材料; (d)形成保护层以保护金属氧化物材料并在金属氧化物材料上形成所需形状和所需数量的导电丝; (e)通过光刻法将保护层蚀刻至金属氧化物材料,从而形成具有图案结构的保护层,该图案层没有保护层的特定区域。 (f)在保护层的整个部分上进行金属注入工艺,以局部地形成与图案化结构相对应的,在金属氧化物材料中包括大量金属的区域,从而形成导电丝; COPYRIGHT KIPO 2014;以及(g)去除具有图案结构的保护层。

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