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A device for the wet chemical treatment of objects, in particular of flat, in particular disk-shaped objects, such as semiconductor wafers, substrates or the like
A device for the wet chemical treatment of objects, in particular of flat, in particular disk-shaped objects, such as semiconductor wafers, substrates or the like
A device for the wet chemical treatment of objects, in particular of flat, in particular disk-shaped objects, such as semiconductor wafers, substrates or the like (12, 14) with– a drum (10) with a loading opening (11) and a drum bottom (24),– a holder (16, 18) for the objects (12, 14), which rotatably about an axis of rotation in the drum (10) is arranged,– a motor (20) with a through the drum bottom (24) passing drive shaft (26) for driving the holder (16, 18),– one or more spray nozzles (22) for spraying the in the holder (16, 18) is supported on the side of the objects (14) with chemicals and– a between the motor (20) and the drum bottom (24), a water seal (30), through which the drive shaft (26) of the motor (20) is guided and of from the drum (10) is sealed chemicals.
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