首页> 外国专利> ANTI-FUSE OTP MEMORY CELL HAVING PERFORMANCE IMPROVEMENT, AND MANUFACTURING METHOD AND OPERATION METHOD OF MEMORY

ANTI-FUSE OTP MEMORY CELL HAVING PERFORMANCE IMPROVEMENT, AND MANUFACTURING METHOD AND OPERATION METHOD OF MEMORY

机译:性能得到改善的反熔丝otp记忆细胞及其制造方法和操作方法

摘要

PROBLEM TO BE SOLVED: To provide an anti-fuse OTP memory cell having performance improvement, and a manufacturing method and operation method of a memory.SOLUTION: An anti-fuse memory cell 200 includes an anti-fuse unit 206, and a selection transistor 208. The anti-fuse unit 206 includes an anti-fuse layer 210 and an anti-fuse gate 212 on a substrate 202, a corrected extension doping region 214 arranged in a substrate below the anti-fuse layer, and doping regions 216, 218 arranged in a substrate on the two facing sides of the anti-fuse gate. The selection transistor 208 includes a selection gate 220, a gate dielectric layer 222, and doping regions 218, 224. The doping regions 218, 224 are arranged, respectively, on the two facing sides of the selection gate in the substrate. The doping region, anti-fuse layer and anti-fuse gate form a varactor.
机译:解决的问题:提供一种具有性能提高的反熔丝OTP存储单元,以及存储器的制造方法和操作方法。解决方案:一种反熔丝存储单元200包括反熔丝单元206和选择晶体管。 208.反熔丝单元206包括在基板202上的反熔丝层210和反熔丝栅极212,布置在反熔丝层下方的基板中的校正的延伸掺杂区214以及掺杂区216、218。布置在反熔丝门的两个相对侧上的衬底中。选择晶体管208包括选择栅220,栅介电层222和掺杂区218、224。掺杂区218、224分别布置在衬底中选择栅的两个相对侧上。掺杂区,反熔丝层和反熔丝栅极形成变容二极管。

著录项

  • 公开/公告号JP2015198253A

    专利类型

  • 公开/公告日2015-11-09

    原文格式PDF

  • 申请/专利权人 EMEMORY TECHNOLOGY INC;

    申请/专利号JP20150071343

  • 发明设计人 WU MENG-YI;CHIN SHINMEI;LU CHUN-HUNG;

    申请日2015-03-31

  • 分类号H01L27/10;G11C17/14;

  • 国家 JP

  • 入库时间 2022-08-21 15:33:21

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