Localized atmospheric laser chemical vapor deposition.

摘要

Atmospheric laser-based chemical vapor deposition (LCVD) technology provides highly localized deposition of materials to mitigate damaged sites on optical components. The same laser beam can be used for the laser beam used for the deposition of the material and the laser beam for annealing the deposited material in situ. The end result of the LCVD method is filling and planarization of the processing site. This provides an optically more damage resistant surface. Several deposition and annealing steps may be performed during the first round to increase the damage threshold of the deposited material while at the same time more precisely controlling the amount of deposited material.