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Localized Synthesis of Carbon Nanotube Films on Suspended Microstructures by Laser-Assisted Chemical Vapor Deposition

机译:激光辅助化学气相沉积法在悬浮微结构上局部合成碳纳米管薄膜

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摘要

A laser-assisted chemical vapor deposition (LCVD) method has been developed for in situ synthesis of carbon nanotube (CNT) films on suspended microstructures. Focused laser beams are used to heat locally the suspended microstructures with low thermal mass and low thermal dissipation to high temperatures for localized CNT growth. Other substrate areas than the microstructures remain at low temperatures, preventing the devices on the substrate from being destroyed by high temperatures. The synthesizing parameters and the influences on CNT morphology and structures are systematically investigated and optimized, and solutions for uniform temperature distribution are proposed. Upon optimization, uniform, localized, and rapid growth of CNT synthesis has been achieved on suspended microstructures, and aligned CNTs with length and uniformity comparable to conventional hot-wall CVD have been successfully obtained. The experimental results show LCVD is a promising technology for in situ and localized synthesis of CNT films on suspended microstructures for CNT-CMOS (complementary metal oxide semiconductor) integration.
机译:已经开发了一种激光辅助化学气相沉积(LCVD)方法,用于在悬浮微结构上原位合成碳纳米管(CNT)膜。聚焦的激光束用于以低的热质量和低的热耗散将悬浮的微结构局部加热到高温,以进行局部的CNT生长。除了微结构之外,其他衬底区域仍保持在低温下,从而防止了衬底上的器件被高温破坏。系统地研究和优化了合成参数及其对碳纳米管形态和结构的影响,提出了均匀分布温度的解决方案。经过优化,已在悬浮的微结构上实现了CNT合成的均匀,局部和快速增长,并成功获得了长度和均匀性可与常规热壁CVD媲美的对齐CNT。实验结果表明,LCVD是用于在悬浮微结构上原位和局部合成CNT膜的有前途的技术,用于CNT-CMOS(互补金属氧化物半导体)集成。

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