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Wiring defect inspection method and a wiring defect inspection apparatus, and method of manufacturing a semiconductor substrate
Wiring defect inspection method and a wiring defect inspection apparatus, and method of manufacturing a semiconductor substrate
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机译:布线缺陷检查方法,布线缺陷检查装置以及半导体基板的制造方法
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摘要
A wiring defect inspecting method in accordance with the present invention comprises: obtaining a resistance of a short-circuited path of a semiconductor substrate; applying a voltage, which is specified on the basis of the resistance obtained, to the semiconductor substrate having a defect portion so as to cause the defect portion to generate heat; and capturing, with use of an infrared camera, an image of the semiconductor substrate whose temperature has increased due to the heat generated from the defect portion.
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