首页> 外国专利> Object processing apparatus, exposure apparatus, exposure method, device manufacturing method, and flat panel display manufacturing method

Object processing apparatus, exposure apparatus, exposure method, device manufacturing method, and flat panel display manufacturing method

机译:物体处理装置,曝光装置,曝光方法,器件制造方法以及平板显示器的制造方法

摘要

A plurality of air levitation units that jet air to the lower surface of a substrate are placed below the substrate, and the substrate is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate is held by a fixed-point stage from below in a noncontact manner, and the surface position of the portion subject to exposure is adjusted in a pinpoint manner. Accordingly, exposure can be performed on the substrate with high precision, and a configuration of a substrate stage device can be simplified.
机译:将空气喷射到基板的下表面的多个空气悬浮单元放置在基板的下方,并且基板以非接触方式被支撑为基本水平。此外,基板的暴露部分以非接触方式从下方通过定点台保持,并且暴露部分的表面位置以精确的方式调节。因此,可以在基板上高精度地进行曝光,并且可以简化基板台装置的构造。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号