Cleaning method and film forming apparatus of the film forming apparatus .

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method of a film forming device capable of efficiently cleaning the inside of the film forming device.;SOLUTION: A cleaning method of a film forming device of an embodiment comprises the steps of: turning a cleaning gas having at least one of a chlorine gas, a hydrocarbon gas, and a chlorohydrocarbon gas into plasma; and supplying the cleaning gas turned into the plasma to the inside of a heated film forming device.;COPYRIGHT: (C)2013,JPO&INPIT