Composition for forming a passivation film comprising a resin having a carbon-carbon multiple bond

摘要

Provided is a passivation film that simultaneously achieves electrical insulation, heat resistance, solvent resistance, and dry etch back characteristics. The following formula (i): (wherein T0 is a sulfonyl group, a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or an arylene group optionally having a substituent and a fluoroalkylene group) Or a combination with a cyclic alkylene group.) Having a unit structure of formula (2-A), formula (2-B), or both at the terminal, side chain, or main chain of the polymer A composition for forming a passivation film, comprising a polymer having at least one group having the structure: The polymer may comprise a unit structure of the following formula (1): [Selection figure] None