Apparatus for coating a substrate in a vacuum chamber by plasma chemical vapor deposition

摘要

This invention the vacuum chamber (1) at least one entrance in order at least to introduce the gas of 1 kinds inside, the target in order to generate (3) and the plasma (5; 9) it possesses one which it has magnetron (4) at least, the vacuum chamber (1) it regards the device which makes precipitate layer the baseplate (2) in inside with the plasma chemical evaporation. With constitution of this invention, the aforementioned target (5; 9) during precipitation of layer, it possesses the temperature of the 300 at least at least in one specified range.