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Semiconductor device with integrated magnetic element provided with a barrier structure against metal contamination, and manufacturing

机译:具有集成的磁性元件的半导体器件及其制造方法,该集成的磁性元件具有防止金属污染的阻挡结构

摘要

A semiconductor device including: a semiconductor body having a first side and a second side opposite to one another; a first barrier element, which extends over the first side of the semiconductor body and is made of a first material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloy; a magnetic element, which extends over the first barrier layer and is made of a second material having magnetic properties, for example a ferromagnetic material; a second barrier element, which extends over the magnetic layer and is made of a third material configured to act as barrier against metal ions, for example chosen from among titanium, tantalum, titanium alloys or compounds, tantalum alloys or compounds. The first and second barrier elements form a top encapsulating structure and a bottom encapsulating structure for the magnetic element.
机译:一种半导体器件,包括:半导体本体,其具有彼此相对的第一侧和第二侧;以及第二半导体器件。第一阻挡元件,其在半导体本体的第一侧上延伸,并且由第一材料制成,该第一材料被构造成用作对金属离子的阻挡,例如选自钛,钽,钛合金或化合物,钽合金;磁性元件,其在第一阻挡层上延伸并且由具有磁性的第二材料例如铁磁材料制成;第二阻挡元件,其在磁性层上延伸,并且由第三材料制成,该第三材料构造成用作对金属离子的阻挡,例如选自钛,钽,钛合金或化合物,钽合金或化合物。第一阻挡元件和第二阻挡元件形成用于磁性元件的顶部封装结构和底部封装结构。

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