Generic approach for synthesizing asymmetric nanoparticles and nanoassemblies

摘要

A generic route for synthesis of asymmetric nanostructures. This approach utilizes submicron magnetic particles (Fe₃O₄—SiO₂) as recyclable solid substrates for the assembly of asymmetric nanostructures and purification of the final product. Importantly, an additional SiO₂ layer is employed as a mediation layer to allow for selective modification of target nanoparticles. The partially patched nanoparticles are used as building blocks for different kinds of complex asymmetric nanostructures that cannot be fabricated by conventional approaches. The potential applications such as ultra-sensitive substrates for surface enhanced Raman scattering (SERS) have been included.