首页>
外国专利>
Nanoimprint lithography formation of functional nanoparticles using dual release layers
Nanoimprint lithography formation of functional nanoparticles using dual release layers
展开▼
机译:使用双剥离层的功能纳米颗粒的纳米压印光刻技术
展开▼
页面导航
摘要
著录项
相似文献
摘要
Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
展开▼