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METHOD FOR THE DETECTION OF DEFECTS IN GAS-BARRIER FILMS USING QUANTUM DOTS

机译:量子点的气膜薄膜缺陷检测方法

摘要

By forming nanoparticles from gas-phase precursors within cracks or defects in a gas-barrier film, crack-width may be determined from the diameter of the nanoparticles formed within. The optical absorption and emission wavelengths of a quantum dot are governed by the particle size. For a particular material, the absorption and/or emission wavelengths may therefore be correlated to the particle size (as determined from techniques such as transmission electron microscopy, TEM). Thus, fluorescence measurement techniques and/or confocal microscopy may be used to determine the size of quantum dots formed within a gas-barrier film, allowing both the size and nature of a defect to be determined. The method may be used to assess the potential effects of defects on the integrity of the gas-barrier film.
机译:通过由气体阻隔膜的裂缝或缺陷内的气相前体形成纳米颗粒,可以根据在其中形成的纳米颗粒的直径确定裂缝宽度。量子点的光吸收和发射波长取决于粒径。因此,对于特定的材料,吸收和/或发射波长可以与颗粒大小相关(如通过透射电子显微镜,TEM等技术确定)。因此,可以使用荧光测量技术和/或共聚焦显微镜来确定在阻气膜内形成的量子点的尺寸,从而可以确定缺陷的尺寸和性质。该方法可用于评估缺陷对阻气膜完整性的潜在影响。

著录项

  • 公开/公告号KR20140139141A

    专利类型

  • 公开/公告日2014-12-04

    原文格式PDF

  • 申请/专利权人 NANOCO TECHNOLOGIES LTD.;

    申请/专利号KR20147033099

  • 发明设计人 PICKETT NIGEL;GRESTY NATHALIE;

    申请日2013-05-03

  • 分类号G01N21/91;G01N21/64;G02B21/00;

  • 国家 KR

  • 入库时间 2022-08-21 15:01:31

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