Selective Sonication-Assisted Deposition Method of Inorganic Particles and CHA Zeolite Membranes Grown from Seeded Uniform Layers on Substrates Using the Method and Plate-like Si-CHA Zeolite Particles and Manufacturing Method of the Same

摘要

Provided is a selective sonication-assisted deposition method of inorganic particles and CHA zeolite membranes grown from seeded uniform layers on substrates using the method and plate-like Si-CHA zeolite particles used for seed layer formation and manufacturing method of the same, in which thin inorganic particles may be selectively deposited on a substrate or on a support, and even a physical interaction between the deposited particles and supports (or substrates) alone allows for obtaining high surface coverage to form a uniform layer, which is critical in reproducible production of membranes of inorganic materials, such as zeolite, by secondary growth.