SELECTIVE SONICATION-ASSISTED DEPOSITION METHOD OF INORGANIC PARTICLES AND CHA ZEOLITE MEMBRANES GROWN FROM SEEDED UNIFORM LAYERS ON SUBSTRATES USING THE METHOD AND PLATE-LIKE SI-CHA ZEOLITE PARTICLES AND MANUFACTURING METHOD OF THE SAME

摘要

Provide sonication-assisted deposition method of the selection of inorganic particles and CHA zeolite membranes, its uniform layer growth from sowing, it generates the sheet Si-CHA zeolite microparticles with manufacturing method in the substrate of application method and for identical seed layer, wherein thin inorganic particles, which can be, is selectively deposited on a substrate or on a bracket, and the physical interaction between deposited particles and bracket (or substrate) allows to obtain high surface coverage individually to form a conforming layer, it is in inorganic material, such as it is crucial in the reproducible production of the film of zeolite, pass through secondary enlargement.