Imprint lithography equipment with self-alignment function of contacting surface and method of imprinting lithography for using the same

摘要

The present invention relates to a self-aligned imprint lithography apparatus and an imprint lithography method using the same. More particularly, in an imprint lithography process, when a stamp and a substrate fixed to a substrate chuck are brought into contact with each other, Alignment of the substrate so that the position of the substrate can be aligned parallel to the contact surface with the stamp, and an imprint lithography method using the self-aligned imprint lithography apparatus.