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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION APPARATUS

机译:微波等离子体化学气相沉积仪

摘要

The present invention is related with for manufacturing a device of gem grade diamond. Device has be arranged in series one most rooms (52) to allow the air-flow from the primary last room in one first Room. Each room has substrate stage assembling (10) to support and enter multiple diamond seeds (19) of room, a microwave generator (36) and a microwave source (38) via a microwave device (37) supply microwave energy). Gas supply (54) supplies gas to the diamond of the first Room of form. The gas supply of first Room is used to exit sequence in the case where becoming for then the first Room of the input of subsequent chamber of a second Room in series in gas. One vacuum pump is after heel row gas chamber.
机译:本发明涉及用于制造宝石级金刚石的装置。该设备已串联布置在一个最多的房间(52)中,以允许来自主要的最后一个房间的气流进入一个第一房间。每个房间具有衬底台组件(10)以支撑并进入房间的多个钻石种子(19),微波发生器(36)和经由提供微波能量的微波设备(37)的微波源(38)。气体供应装置(54)将气体供应给第一个表格房间的钻石。第一室的供气用于在串联的第二室的后续室的输入变为第一室的情况下退出顺序。在后排气室之后有一个真空泵。

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