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Method of Manufacturing Semiconductor Element Using Laser Lift-Off Process and Double Transference

机译:利用激光剥离工艺和双转移制造半导体元件的方法

摘要

According to the present invention, there is provided a method of manufacturing a semiconductor device, comprising: forming a semiconductor layer on a substrate; A first transfer step of transferring the semiconductor layer to a first flexible film through a laser lift-off process; And a second transfer step of transferring the semiconductor layer from the first flexible film to the second flexible film. The present invention also provides a laser lift-off process and a method of manufacturing a semiconductor device using dual transfer. According to the present invention, the semiconductor layer can be separated so that the surface exposed when the semiconductor layer is grown is exposed to the outside.
机译:根据本发明,提供了一种制造半导体器件的方法,包括:在基板上形成半导体层;以及在基板上形成半导体层。第一转移步骤是通过激光剥离工艺将半导体层转移到第一柔性膜上。第二转移步骤是将半导体层从第一柔性膜转移到第二柔性膜。本发明还提供了激光剥离工艺和使用双转印的半导体器件的制造方法。根据本发明,可以分离半导体层,使得在生长半导体层时暴露的表面暴露于外部。

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