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acid generator which contains a suitable salt and a chemically amplified positive resist composition

机译:含合适盐和化学放大正性抗蚀剂成分的产酸剂

摘要

The present invention provides a salt of formula (I). ; formula I ; Formula 1 In, Q 1 and Q 2 are each independently a fluorine atom or a C1-C6 perfluoroalkyl group, and T is the methylene group or carbonyl group, the R is C1-C4 alkyl group, C1-C4 alkoxy group, a hydroxyl group, a hydroxymethyl group, a cyano group, and one or more substituted adamantyl group with substituents selected from the group consisting of an oxo group, A + is an organic counterion. ; This invention further provides a chemically amplified resist composition comprising a salt of formula (I) mentioned above. ; The resist composition, acid generator
机译:本发明提供式(I)的盐。 ;公式I;式1其中,Q 1 和Q 2 各自独立地为氟原子或碳数为1〜6的全氟烷基,T为亚甲基或羰基,R为C 1 -C 4烷基,C 1 -C 4烷氧基,羟基,羟甲基,氰基和一个或多个取代的金刚烷基,其取代基选自由氧代基组成的组,A + 是有机抗衡离子。 ;本发明进一步提供了一种包含上述式(I)的盐的化学放大的抗蚀剂组合物。 ;抗蚀剂组合物,产酸剂

著录项

  • 公开/公告号KR1015475680000B1

    专利类型

  • 公开/公告日2015-08-26

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR1020080071751

  • 发明设计人 타케모토 이치키;

    申请日2008-07-23

  • 分类号C07C309/06;C07C309/07;G03F7/004;

  • 国家 KR

  • 入库时间 2022-08-21 14:57:48

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