首页> 外国专利> A salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

A salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

机译:适用于产酸剂的盐和含有该盐的化学放大正性抗蚀剂组合物

摘要

The present invention provides a salt of formula (I). ; formula I ; the above formula in 1, ; and at least one X is a divalent C3-C30 2 is a group containing an alicyclic hydrocarbon group, the C3-C30 2 is one or more from the group -CH 2 - may be replaced by -O- or -CO-, ; Y is C1-C6 alkoxy group, C1-C4 perfluoroalkyl group, C1-C6 hydroxyalkyl group, hydroxyl cyano group and C3-C30 cyclic hydrocarbon group which may be substituted with one or more groups selected from the group, and the C3-C30 cyclic hydrocarbon group at one or more -CH 2 - is -O- or - may be substituted by CO-, ; Q 1 and Q 2 are each independently an alkyl group, a fluorine atom or a C1-C6 perfluoroalkyl, and , ; A + is an organic counter ions. ; acid-generating agent, a chemically amplified positive resist composition, a resin, a structural unit
机译:本发明提供式(I)的盐。 ;公式I;上面的公式1;并且至少一个X是二价C3-C30 2是包含脂环族烃基的基团,C3-C30 2是-CH 2 -中的一个或多个可以被-O取代-或-CO- ,; Y为C 1 -C 6烷氧基,C 1 -C 4全氟烷基,C 1 -C 6羟烷基,羟基氰基和C 3 -C 30环烃基,其可以被选自以下的一个或多个基团取代,以及C 3 -C 30环在一个或多个-CH 2 -处的烃基是-O-或-可以被CO-取代; Q 1 和Q 2 分别独立地为烷基,氟原子或C1-C6全氟烷基。 + 是有机抗衡离子。 ;产酸剂,化学放大正型抗蚀剂组合物,树脂,结构单元

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号