PHASE-SHIFTING MASK BLANK AND PHASE-SHIFTING MASK AND PROCESS FOR PRODUCING SAME

摘要

edge emphasis type phase shift mask with a high mass production manufacturing as appropriate phase It provides shift mask blank. Phase shift mask blank of the present invention (MB) is a glass substrate (S) and, formed on the surface of the glass substrate, a phase shift layer of chromium (Cr) as a main component (11) and, above the direction to the phase-shift layer from the glass substrate ( ) to and formed on the phase shift layer, Ni, Co, Fe, Ti, Si, Al, Nb, Mo, an etching stopper layer as a main component metal of at least one member selected from W, and Hf (12) and, an etching stopper is formed on the layer, the Cr and having a light-blocking layer 13 as a main component. ;