PHASE-SHIFTING MASK BLANK, AND PHASE-SHIFTING MASK AND PROCESS FOR PRODUCING SAME

摘要

edge emphasis type phase shift mask with a higher mass productivity to that for manufacturing the phase shift mask blank provided The . A phase shift mask blank of the present invention (MB) is a glass substrate (S) and , formed on the surface of the glass substrate, a phase shift layer of chromium (Cr) as a main component (11) and , above the direction to the phase-shift layer from the glass substrate () to and formed on the phase shift layer , Ni, Co, Fe, Ti, Si, Al, Nb, Mo, an etching stopper layer composed mainly of a metal of at least one member selected from W, and Hf (12) and , formed on the etching stopper layer , and a light-shielding layer 13 of chromium (Cr) as a main component . ;