METHODS OF PREPARING TITANIUM CONTAINING THIN FILMS BY ATOMIC LAYER DEPOSITION USING MONOCYCLOPENTADIENYL TITANIUM-BASED PRECURSORS

摘要

by atomic layer deposition on a titanium-containing film forming method it is provided. The method includes passing at least one precursor to a substrate, the structure of one or more precursors are shown in formula I: Where, R is C ₁ -C ₆ alkyl; n is 0, 1, 2, 3, 4, or 5; L is C ₁ -C ₆ alkoxy or amino, where the amino is optionally C ₁ -C ₆ is one or independently substituted two times with alkyl. ;