METHOD FOR NANOPATTERNING SURFACE OF DIELECTRIC SUBSTRATE USING NEAR-FIELD LITHOGRAPHY

摘要

FIELD: physics.SUBSTANCE: method includes forming a near-field mask on the surface of a dielectric substrate and irradiating the obtained structure with a femtosecond laser pulse. The laser radiation is first passed through a nonlinear optical crystal with a coefficient of transformation into a second harmonic equal to 5-7%. The dielectric substrate coated with the near-field mask is irradiated with the obtained bichromatic femtosecond pulse with energy density in the range of 25-40 mJ/cm, which is less than the laser radiation energy density normally used in similar nanopatterning.EFFECT: high resolution and low laser radiation energy consumption.6 dwg