首页> 外国专利> GALNASSB SOLID SOLUTION-BASED HETEROSTRUCTURE, METHOD FOR PRODUCING SAME AND LIGHT EMITTING DIODE BASED ON SAID HETEROSTRUCTURE

GALNASSB SOLID SOLUTION-BASED HETEROSTRUCTURE, METHOD FOR PRODUCING SAME AND LIGHT EMITTING DIODE BASED ON SAID HETEROSTRUCTURE

机译:基于GALNASSB固溶体的异质结构,基于所述异质结构的相同发光二极管的生产方法

摘要

The present invention relates to a field of semiconductor devices, and more particularly to a heterostructure based on a GaInAsSb solid solution with a reverse p-n junction, to a method of producing the heterostructure, and to a light emitting diode based on the heterostructure. The provided heterostructure comprises a substrate containing GaSb, an active layer which contains a GaInAsSb solid solution and which is disposed over the substrate, a confining layer for localizing major carriers which contains a AlGaAsSb solid solution and which is disposed over the active layer, a contact layer which contains GaSb and which is disposed over the confining layer, wherein the heterostructure further comprises a buffer layer which contains a GaInAsSb solid solution and which is disposed between the substrate and the active layer, the buffer layer containing indium (In) less than the active layer. Use of this buffer layer makes it possible to localize minor carriers in an active region, thereby resulting in an increased amount of radiative recombination and, therefore, an increased quantum efficiency of the heterostructure. Furthermore, use of the buffer layer makes it possible to minimize an influence of defects penetrating from the substrate into the active region, thereby resulting in reduction in deep acceptor levels and, correspondingly, in reduction in amount of non-radiative Shokley-Read-Hall recombination, and also to increased quantum efficiency of the heterostructure. Light emitting diodes produced on the basis of the provided heterostructure emit in a mid-infrared spectral range of 1.8-2.4 µm.
机译:本发明涉及半导体器件领域,更具体地涉及基于具有反向p-n结的GaInAsSb固溶体的异质结构,产生该异质结构的方法以及基于该异质结构的发光二极管。所提供的异质结构包括:包含GaSb的衬底;包含GaInAsSb固溶体并设置在衬底上方的有源层;用于局部化包含AlGaAsSb固溶体并设置在有源层上方的主要载流子的限制层;接触层。包含GaSb且位于限制层上方的层,其中异质结构还包括缓冲层,其包含GaInAsSb固溶体并且位于衬底与有源层之间,该缓冲层包含的铟(In)小于活动层。使用该缓冲层使得可以将次要载流子定位在活性区域中,从而导致增加的辐射复合量,并因此提高了异质结构的量子效率。此外,通过使用缓冲层,可以使从基板渗透到活性区域的缺陷的影响最小化,因此可以降低深受主能级,因此可以减少无辐射的Shokley-Read-Hall。重组,也提高了异质结构的量子效率。根据提供的异质结构生产的发光二极管在1.8-2.4 µm的中红外光谱范围内发射。

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