SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND PRODUCTION METHOD OF THE SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM AND PRODUCTION METHOD OF THE DRY FILM, PATTERN FORMING METHOD, LAMINATE, AND SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a silicone skeleton-containing polymer compound suitably used as a base resin for a chemically amplified negative resist material that can solve a problem of delamination occurring on a substrate and allows formation of a fine pattern.SOLUTION: The silicone skeleton-containing polymer compound has a weight average molecular weight of 3,000 to 500,000 and includes a -CH-Si(CH)-P-Φ-Si(CH)-X unit and a -CH-Si(CH)-(-O-Si(CH)-)-CH-X unit.SELECTED DRAWING: None