Substrate support including surface features to reduce reflection, and manufacturing techniques for manufacturing the substrate support

摘要

Methods and apparatus are provided for reducing thermal signal noise in a processing chamber that uses a non-contact temperature sensing device to measure the temperature of the processing chamber components. In certain embodiments, a susceptor that supports a substrate in a processing chamber includes a first surface that includes a substrate support surface and a second surface opposite the first surface, wherein a portion of the second surface is , Including features that absorb incident radiant energy. [Selection] Figure 2