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RESISTIVITY CONTROL METHOD, ADDITIONAL DOPANT FEED DEVICE, AND N-TYPE SILICON SINGLE CRYSTAL

机译:电阻率控制方法,附加掺杂剂馈送装置和N型硅单晶

摘要

PROBLEM TO BE SOLVED: To provide a resistivity control method capable of suppressing a decrease in yield and also precisely controlling resistivity when silicon single-crystal raising by a CZ method is interrupted, and a silicon single crystal having been raised is molten again to be raised again.;SOLUTION: A resistivity control method of controlling resistivity of a silicon single crystal raised by a CZ method with a dopant includes the processes of: performing initial doping with a main dopant so that the silicon single crystal has a predetermined conductivity type; and performing continuous or intermittent additional doping with a sub-dopant having the opposite conductivity type from the main dopant according to a solidification rate while raising the silicon single crystal, in which the raising of the silicon single crystal interrupted and the silicon single crystal having been raised is molten again to be raised again, the silicon single crystal is raised again after being doped with the main dopant by such an amount that top-side resistivity of a product part is within a standard if additional dopant with the sub-dopant is performed before the interruption.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:提供一种电阻率控制方法,该方法能够抑制产率的下降,并且当中断通过CZ法进行的单晶硅的生长并且再次熔化已经升高的硅单晶以进行升高时,还能够精确地控制电阻率。一种解决方案:一种电阻率控制方法,用于控制通过CZ法用掺杂剂提高的硅单晶的电阻率,该方法包括以下步骤:用主掺杂剂进行初始掺杂,以使硅单晶具有预定的导电类型;在提高硅单晶的同时,根据凝固速率,用与主掺杂剂相反的导电类型的副掺杂剂进行连续或间歇的附加掺杂,其中硅单晶的生长被中断并且硅单晶已经升高的熔体再次熔化以再次升高,在掺杂了主掺杂剂之后,单晶硅再次升高,使得如果执行与次掺杂剂一起添加的掺杂剂,则产品部件的顶侧电阻率在标准范围内中断之前;;选定的图纸:图1;版权:(C)2016,JPO&INPIT

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