CHEMICAL VAPOR DEPOSITION SYSTEM, CONFIGURATION OF CHEMICAL VAPOR DEPOSITION SYSTEM, AND CHEMICAL VAPOR DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a chemical vapor deposition system, a configuration of the chemical vapor deposition system and a chemical vapor deposition method, by which operational advantages can be achieved which are obtained in simultaneously operating a plurality of chemical vapor deposition systems.;SOLUTION: A chemical vapor deposition system includes: a first chemical vapor deposition system 401 equipped with a first coating chamber 403; a second chemical vapor deposition system 405 equipped with a second coating chamber 407; and a fluid introduction system 201 having a vacuum pump and a fluid introduction configuration which are configured and arranged to introduce a fluid into one or both of the first coating chamber 403 and the second coating chamber 407 for performing chemical vapor deposition coating. Further, at least one part of the fluid introduction system 201 is configured for operation using the first chemical vapor deposition system 401 and the second chemical vapor deposition system 405.;SELECTED DRAWING: Figure 4;COPYRIGHT: (C)2016,JPO&INPIT