Method of manufacturing an edge emphasis type phase shift mask and the edge enhancement phase shift mask

摘要

PROBLEM TO BE SOLVED: To provide a production method of an edge-enhanced phase shift mask, by which dimensional accuracy of a pattern in a phase shift film can be made uniform.;SOLUTION: The production method of an edge-enhanced phase shift mask includes the steps of: forming a conductive light-shielding film 10 on a transparent substrate 100; applying a positive resist 300 on the light-shielding film; drawing a pattern in the positive resist; developing the positive resist to form a resist pattern; removing an exposed part of the light-shielding film by etching to form a light-shielding pattern where the positive resist remains; immersing the transparent substrate having the light-shielding pattern thus formed together with a metal substance for forming a phase shift film, in an electrolytic cell reserving an electrolytic liquid, and applying a voltage between the light-shielding film and the metal substance to deposit a phase shift film on a pattern end face of the light-shielding pattern by electrolytic plating.;COPYRIGHT: (C)2014,JPO&INPIT