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Method and enhancing clear field phase shift masks with border around edges of phase regions
Method and enhancing clear field phase shift masks with border around edges of phase regions
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机译:在相位区域的边缘周围具有边界的清晰场相移掩模的方法和增强
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摘要
A technique in which a first boundary region is added to the ends of phase zero (0) pattern defining polygons and a second boundary region is added to the ends of phase 180 pattern. This technique can improve line end pattern definition and improve the manufacturability and patterning process window. The added boundary region balances the light on both sides of the line ends, resulting in a more predictable final resist pattern.
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