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Method for determining the activity doping concentration of the doped semiconductor region

机译:确定掺杂半导体区域的活性掺杂浓度的方法

摘要

System (200) and a method for determining optically the doping profile activated almost completely is described. Doping profile activated almost completely, is characterized by a set of physical parameters. The method (200), and that the sample containing the doping profile was fully activated, and to obtain a reference, for the reference and the sample containing the doping profile was fully activated, light modulation reflectance (PMOR) offset to obtain a DC reflectometry data and curve measurement data (210, 230), based on both the light modulation reflectance offset curve measurement values ​​and DC reflectance measurements, the values ​​for the set of physical parameters of the doping profile and a (220, 240) to be determined.
机译:描述了用于光学地确定几乎完全激活的掺杂分布的系统(200)和方法。掺杂曲线几乎完全被激活,其特征在于一组物理参数。方法(200),并且将包含掺杂分布图的样品完全活化,并获得参考,对于作为参考并且将包含掺杂分布图的样品充分活化,光调制反射率(PMOR)偏移以获得DC反射法数据和曲线测量数据(210、230),基于光调制反射率偏移曲线测量值和DC反射率测量值,掺杂轮廓的一组物理参数的值和(220、240)待定。

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