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Method for determining the activity doping concentration of the doped semiconductor region
Method for determining the activity doping concentration of the doped semiconductor region
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机译:确定掺杂半导体区域的活性掺杂浓度的方法
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摘要
System (200) and a method for determining optically the doping profile activated almost completely is described. Doping profile activated almost completely, is characterized by a set of physical parameters. The method (200), and that the sample containing the doping profile was fully activated, and to obtain a reference, for the reference and the sample containing the doping profile was fully activated, light modulation reflectance (PMOR) offset to obtain a DC reflectometry data and curve measurement data (210, 230), based on both the light modulation reflectance offset curve measurement values and DC reflectance measurements, the values for the set of physical parameters of the doping profile and a (220, 240) to be determined.
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