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GROWTH OF SILICON AND BORON NITRIDE NANOMATERIALS ON CARBON FIBERS BY CHEMICAL VAPOR DEPOSITION
GROWTH OF SILICON AND BORON NITRIDE NANOMATERIALS ON CARBON FIBERS BY CHEMICAL VAPOR DEPOSITION
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机译:化学气相沉积法在碳纤维上生长硅和氮化硼纳米材料
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摘要
Methods of growing boron nitride nanotubes and silicon nanowires on carbon substrates formed from carbon fibers. The methods include applying a catalyst solution to the carbon substrate and heating the catalyst coated carbon substrate in a furnace in the presence of chemical vapor deposition reactive species to form the boron nitride nanotubes and silicon nanowires. A mixture of a first vapor deposition precursor formed from boric acid and urea and a second vapor deposition precursor formed from iron nitrate, magnesium nitrate, and D-sorbitol are provided to the furnace to form boron nitride nanotubes. A silicon source including SiH4 is provided to the furnace at atmospheric pressure to form silicon nanowires.
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