METHOD FOR MEASURING PATTERNED SAPPHIRE SUBSTRATE

摘要

An optical measuring method for measuring the surface of a patterned sapphire substrate is provided. The method has the following steps: using an automated optical inspection procedure to check the surface of the patterned sapphire substrate and define a non-defective area and a defective area; providing a light source to emit a first light beam; making the first light beam pass through an optical fiber connector and an optical probe, and focus on a measurement focal point defined on the surface of the patterned sapphire substrate. The measurement focal point is disposed on the non-defective area. The optical probe has a pinhole disposed opposite the measurement focal point. The first light beam is emitted into the pinhole. The pinhole and the measurement focal point are conjugated.