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Thin film deposition source, deposition apparatus and deposition method using the same
Thin film deposition source, deposition apparatus and deposition method using the same
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机译:薄膜沉积源,沉积设备以及使用该薄膜沉积源的沉积方法
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摘要
A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance.
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